Sea Foam Patterns (Detail)
Dan Olfe, 2011, 36" x 59", Digitally printed whole-cloth quilt created with 3D software (Maya) and modified in Photoshop.
August 7 – October 14, 2012
August 12: Members-only Walkthrough 1pm to 2pm
Opening Reception 2pm to 4pm
Please RSVP to email@example.com.
These exhibitions sponsored in part by:
The 2nd International TECHstyle Art Biennial is a juried exhibition, focusing on new ways in which contemporary fiber artists are using technology as a part of their artistic process or within the content of their work. Piecing together an experience that is both historical and contemporary — TECHstyle exposes and explores the technological tensions and provocative imagery within the realm of fiber, cloth, and fashion.
With art that will appeal to both the traditional quilter, and the technophile alike, the exhibition includes pieces that feature traditional hand-work (such as locally hand-made Kapa cloth) as well as high-tech pieces of quilted binary code, QR code, and HTML; digital processes including machine embroidery, jacquard weaving, and printing; 3-D rendering; laser engraving; and much more. Quilt enthusiasts will particularly delight in the wide range of quilts that make use of digital imagery and digital printing. The work featured in this exhibition is sculptural, clever, and transformative.
Curator Deborah Corsini gives us a few key examples:
"Artist Wen-Yin Huang used various 'new' materials like luminous yarns, metallic, spun polyester and Jacquard hand weaving that transform under three different types of rotating light sources-regular light, UV light, and darkness – to show different images. Yuan Guoxiang used laser engraving to create sculptural garments that hang on the wall. Many artists in the exhibit used digital jacquard weaving to create complicated layered imagery that is abstract or representational. Others, such as Dan Ofle, used Photoshop and Maya (animation) software to create their quilted imagery."
These emerging artists and well-established practitioners are a part of this 2nd TECHstyle Biennial that connects with the larger ZERO1 Biennial exhibitions and festival. Leveraging its location in Silicon Valley, TECHstyle serves as the premiere platform for introducing the emerging work of artists exploring the intersection of fiber art and technology to the global community assembles — virtually and in the real world — at San Jose's 2012 ZERO1 Biennial.
From an entry pool of 124 pieces of art, the exhibition was narrowed down to 44 works by 37 artists by jurors Janet Koplas, Barbara Layne and Christine Tarkowski. The exhibition highlights the multi-cultural nature of technology-influenced contemporary art, with work submitted from ten countries – including Australia, Canada, China, Finland, France, Japan, Korea, Taiwan, and from across the United States (including local California artists as well as those from Florida, Ohio, South Carolina, Missouri, Maryland, and Washington).
Artists included are:
Brett Alexander, Brigitte Amarger, Joanne Arnett, Regina Benson, Gudny Campbell, D. Cichon / Anitta Toivio, Gabrielle Duggan, John Dugger, Laura Fischer, Jayne Gaskins, Sarah Gotowka, Guoxiang Yuan, Gloria Hansen, Wen-Yin Huang, Julianna Joos, Jeeun Kim, Carol Krueger, Janice Lessman-Moss, Donna Lish, Paula Erenberg Medeiros, Suzanne Morlock, Emiko Nakano, Barbara Nepom, Dan Olfe, Ellen Oppenheimer, Pixeladies, Pam RuBert, Sandra Rude, Alice Schlein, Patti Shaw, Christine Spangler, Wendeanne Ke’aka Stitt, Yumika Tanaka, Nelcy Tarics, Leslie Terzian Markoff, and Charlotte Ziebarth
These exhibitions and related programs are funded in part by the David and Lucile Packard Foundation; Arts Council Silicon Valley in partnership with the County of Santa Clara; the City of San Jose; the Santa Clara Valley Quilt Association, and Tapestry Weavers West.